S315879
Tetrakis(dimethylamido)hafnium(IV) , packagedforuseindepositionsystems , 19782-68-4
Pack Size | Price | Stock | Quantity |
25g | RMB16992.69 | In Stock |
|
others | Enquire |
Update time: 2022-07-08
PRODUCT Properties
Melting point: | 26-29 °C(lit.) |
Boiling point: | 85°C/0.1mm |
Density | 1.098 g/mL at 25 °C |
Flash point: | 109 °F |
form | crystal |
color | colorless to pale yellow |
Specific Gravity | 1.40 |
Hydrolytic Sensitivity | 8: reacts rapidly with moisture, water, protic solvents |
Sensitive | moisture sensitive, store cold |
InChIKey | ZYLGGWPMIDHSEZ-UHFFFAOYSA-N |
CAS DataBase Reference | 19782-68-4 |
Description and Uses
Used as precursor for atomic layer deposition of Hafnium Oxide nanolaminates, which are used as a reploacement for Silicon oxide in semiconductor devices.
Safety
Symbol(GHS) | ![]() ![]() GHS02,GHS05 |
Signal word | Danger |
Hazard statements | H228-H261-H314 |
Precautionary statements | P210-P231+P232-P280-P305+P351+P338-P370+P378-P402+P404 |
Hazard Codes | F,C |
Risk Statements | 11-14-34 |
Safety Statements | 6-26-36/37/39-43-45 |
RIDADR | UN 3396 4.3/PG 2 |
WGK Germany | 3 |