M4239953
TRIS(DIMETHYLAMINO)SILANE , 99.999% , 15112-89-7
Synonym(s):
TDMAS;Tris(dimethylamino)silane;Tris(dimethylamido)silane;(Me2N)3SiH;N,N,N′,N′,N′′, N′′-Hexamethylsilanetriamine
CAS NO.：15112-89-7
Empirical Formula: C6H19N3Si
Molecular Weight: 161.32
MDL number: MFCD00048006
EINECS: 239-165-0
| Pack Size | Price | Stock | Quantity |
| 25g | RMB1116.80 | In Stock |
|
| others | Enquire |
Update time: 2022-07-08
PRODUCT Properties
| Melting point: | <0°C |
| Boiling point: | 145 °C |
| Density | 0,838 g/cm3 |
| refractive index | 1.4247 |
| Flash point: | 25°C |
| storage temp. | 2-8°C, protect from light |
| pka | 10.93±0.70(Predicted) |
| form | liquid |
| color | colorless to light yellow |
| Specific Gravity | 0.84 |
| Sensitive | air sensitive, moisture sensitive |
| Hydrolytic Sensitivity | 8: reacts rapidly with moisture, water, protic solvents |
| EPA Substance Registry System | N,N,N',N',N'',N''-Hexamethylsilanetriamine (15112-89-7) |
Description and Uses
Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.
Safety
| Symbol(GHS) |    GHS02,GHS05,GHS06 |
| Signal word | Danger |
| Hazard statements | H225-H261-H302-H311-H314-H330 |
| Precautionary statements | P210-P231+P232-P280-P303+P361+P353-P304+P340+P310-P305+P351+P338 |
| Hazard Codes | F,C |
| Risk Statements | 10-36/37/38-52/53-34-29-20-15-11 |
| Safety Statements | 16-26-36/37/39-45-43 |
| RIDADR | 1993 |
| WGK Germany | 3 |
| RTECS | VV5800000 |
| TSCA | Yes |
| Toxicity | rabbit,LD50,skin,477mg/kg (477mg/kg),LIVER: OTHER CHANGESLUNGS, THORAX, OR RESPIRATION: CHRONIC PULMONARY EDEMA,Toxicology and Industrial Health. Vol. 5, Pg. 45, 1989. |
